J.A. Van Vechten, J.M. Blum, et al.
IEEE T-ED
Paper
Reasons to believe pulsed laser annealing of Si does not involve simple thermal melting
Abstract
Many recent publications dealing with Si pulsed laser annealing have assumed that the transformation is strictly thermal melting-recrystallization. We recount observations indicating the material was not subjected to thermal melting. © 1979.
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