Oleg Kostko, Bo Xu, et al.
Journal of Chemical Physics
We describe the details of construction and operation of an instrument useful for the characterization of dissolution kinetics of thin films. This device, based on a quartz crystal microbalance operating in contact with a liquid, avoids the limitations associated with the use of optical, electrical, and mechanical dissolution rate measurement techniques. The QCM rate monitor has general application to the measurement of the kinetics of dissolution of transparent and opaque thin films such as dielectrics, metals, and polymeric resists.
Oleg Kostko, Bo Xu, et al.
Journal of Chemical Physics
Linda K. Sundberg, Greg M. Wallraff, et al.
SPIE Photomask Technology + EUV Lithography 2010
Chris Bencher, Jeffrey Smith, et al.
SPIE Advanced Lithography 2011
Bogdan Dragnea, Jan Preusser, et al.
Applied Surface Science