Robert W. Keyes
Physical Review B
Paper
Positive mode silylation process characterization
Abstract
In this paper we wish to report on our progress in developing a positive TSI system with emphasis on what we believe is a novel approach for characterizing the silylation process. © 1992.
Related
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
R.W. Gammon, E. Courtens, et al.
Physical Review B
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials