FPGA-based coprocessor for text string extraction
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000
We are inspired by the beauty and simplicity of self-organizing materials and the promise they hold for enabling continued improvements in semiconductor technology. Self assembly is the spontaneous arrangement of individual elements into regular patterns; under suitable conditions, certain Materials self organize into useful nanometer-scale patterns of importance to high-performance microelectronics applications. Polymer self assembly is a nontraditional approach to patterning integrated circuit elements at dimensions and densities inaccessible to traditional lithography methods. We review here our efforts in IBM to develop and integrate self-assembly processes as high-resolution patterning alternatives and to demonstrate targeted applications in semiconductor device fabrication. We also provide a framework for understanding key requirements for the adoption of polymer self-assembly processes into semiconductor technology, as well as a discussion of the ultimate dimensional scalability of the technique. © Copyright 2007 by International Business Machines Corporation.
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000
Robert E. Donovan
INTERSPEECH - Eurospeech 2001
Inbal Ronen, Elad Shahar, et al.
SIGIR 2009
Beomseok Nam, Henrique Andrade, et al.
ACM/IEEE SC 2006