Applied Physics Letters

Paper

01 Jan 1985

Photochemical generation and deposition of copper from a gas phase precursor

View publication

Abstract

The photochemical generation and deposition of copper metal from a volatile copper coordination complex are described. Pulsed and cw ultraviolet light sources were used to induce deposition. The chemical compositions of the films are compared for all methods.

Related

Conference paper

Aerial image contrast using interferometric lithography: Effect on line-edge roughness

M.I. Sanchez, W.D. Hinsberg, et al.

SPIE Advances in Resist Technology and Processing 1999

Paper

Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists

F.A. Houle, N. Maxim, et al.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Conference paper

Experimental method for quantifying acid diffusion in chemically amplified resists

G.M. Wallraff, W.D. Hinsberg, et al.

SPIE Advances in Resist Technology and Processing 1999

Paper

Chemical changes accompanying facet degradation of AlGaAs quantum well lasers

F.A. Houle, D. Neiman, et al.

Journal of Applied Physics

View all publications