Conference paper
Evaluation of 32nm Advanced immersion lithography pellicles
N. Zhou, K. Racette, et al.
SPIE Photomask Technology + EUV Lithography 2008
The photochemical generation and deposition of copper metal from a volatile copper coordination complex are described. Pulsed and cw ultraviolet light sources were used to induce deposition. The chemical compositions of the films are compared for all methods.
N. Zhou, K. Racette, et al.
SPIE Photomask Technology + EUV Lithography 2008
F.A. Houle
Physical Review Letters
Scott L. Anderson, F.A. Houle, et al.
The Journal of Chemical Physics
F.A. Houle, W.D. Hinsberg, et al.
ACS Spring 1999