Applied Physics Letters

Paper

01 Jan 1985

Photochemical generation and deposition of copper from a gas phase precursor

View publication

Abstract

The photochemical generation and deposition of copper metal from a volatile copper coordination complex are described. Pulsed and cw ultraviolet light sources were used to induce deposition. The chemical compositions of the films are compared for all methods.

Related

Paper

Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist

F.A. Houle, W.D. Hinsberg, et al.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Paper

Time-resolved detection of Cu atoms during photochemical laser metal vapor deposition

E.E. Marinero, C.R. Jones

The Journal of Chemical Physics

Paper

Laser chemical vapor deposition of copper

F.A. Houle, C.R. Jones, et al.

Applied Physics Letters

Paper

Mechanistic studies of chemically amplified photoresists

W.D. Hinsberg, G.M. Wallraff, et al.

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

View all publications