Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The oxidation of ultra high-vacuum-cleaved GaAs(110) surfaces has been studied with high-resolution, core-level photoemission excited with synchrotron radiation. The oxidation is spatially and chemically inhomogeneous, and both subsurface oxidation and multibonding geometries occur already at submonolayer coverages. © 1984 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999