PaperOn the phenomenological model of preferred sputtering for SIMS and Auger profiling: A critical analysisN.J. Chou, M.W. ShaferSurface Science
PaperInteraction of Ti with fused silica and sapphire during metallizationY.S. Chaug, N.J. Chou, et al.Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperDielectric loss in thin films of an aromatic polyimideM.O. Aboelfotoh, C. Feger, et al.Applied Physics Letters
PaperInterfacial Reaction During Metallization of Cured Polyimide: An XPS StudyN.J. Chou, C.H. TangJVSTA
