V.J. Minkiewicz, M. Chen, et al.
Applied Physics Letters
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma-etching discharges and a comparison is made to available data in the literature.
V.J. Minkiewicz, M. Chen, et al.
Applied Physics Letters
E.-A. Knabbe, J.W. Coburn, et al.
Surface Science
C.D. Tesche, K.H. Brown, et al.
IEEE Transactions on Magnetics
C. Vanneste, C.C. Chi, et al.
Physical Review B