Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
Andrew Skumanich
SPIE Optics Quebec 1993
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.