E. Ziegler, Y. Lepetre, et al.
Applied Physics Letters
In this review of recent progress in lithography and microscopy by X-rays the authors show how X-ray lithography is used to replicate microcircuit patterns with dimensions below 1 mu m, and how these advances have improved the older technique of X-ray microradiography.
E. Ziegler, Y. Lepetre, et al.
Applied Physics Letters
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
R. Harmon, R. Rosner, et al.
Astrophysical Journal
K. Konnerth, J.C. Marinace, et al.
Journal of Applied Physics