S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
J. Tersoff
Applied Surface Science