Lawrence Suchow, Norman R. Stemple
JES
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
Lawrence Suchow, Norman R. Stemple
JES
J.Z. Sun
Journal of Applied Physics
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules