Conference paper
New polysilicon disposable sidewall process for sub-50 nm CMOS
K.L. Lee, D. Boyd, et al.
ESSDERC 2001
The lateral scaling in carbon nanotube field effect transistors was analyzed. These devices exhibit markedly different transistor characteristics when switched using gate segments controlling the device interior versus those near the source and the drain. This was due to a change from Schottky-barrier modulation at the contacts to bulk switching.
K.L. Lee, D. Boyd, et al.
ESSDERC 2001
Ph. Avouris, N.J. Dinardo, et al.
The Journal of Chemical Physics
Ph. Avouris, J.E. Demuth
Surface Science
R.E. Walkup, D.M. Newns, et al.
Physical Review B