F.A. Houle, C.T. Rettner, et al.
Applied Physics Letters
F.A. Houle, C.T. Rettner, et al.
Applied Physics Letters
L. Baufay, F.A. Houle, et al.
Journal of Applied Physics
T.T. Kodas, T.H. Baum, et al.
Journal of Applied Physics
N. Zhou, K. Racette, et al.
SPIE Photomask Technology + EUV Lithography 2008