P. Chaudhari, R.B. Laibowitz
Thin Solid Films
Josephson tunnel junctions have been fabricated incorporporating a thin layer of normal metal which is oxidized to form the tunnel barrier. The tunnel devices tested were of the form Nb/Al/Al2O3/Nb and several milliamperes of Josephson current were observed at 4.2°K. These samples have been found to have better defined tunneling characteristics than samples of the form Nb/NbOx/Nb. © 1972 The American Institute of Physics.
P. Chaudhari, R.B. Laibowitz
Thin Solid Films
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Physica C: Superconductivity and its applications
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