IIIB-5 Fabrication of Thin Gate Oxide MOSFET's Using Low-Temperature Plasma-Enhanced Chemical-Vapor-Deposited SiO₂

J. Angilello, J.E.E. Baglin, et al.

Journal of Electronic Materials

E.A. Irene, E. Tierney, et al.

JES

D.A. Buchanan, J. Batey, et al.

IEEE Electron Device Letters

E.A. Irene, N.J. Chou, et al.

JES