Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Variations of the thermal expansion coefficient of thin polyimide films as a function of film thickness (40-260 nm) have been measured by monitoring film thickness as a function of temperature using X-ray reflectivity from samples of poly(pyromellitic dianhydride oxydianiline) (PMDA-ODA) films spin-cast onto silicon wafers. The effective expansion coefficient of the film decreases with decreasing thickness and is consistent with a bilayer model in which an interfacial region of constant thickness is formed for each film. The expansion coefficient of this surface or interfacial region is less than one-third the coefficient of the interior of the films. A simple method is described whereby the thermal expansion coefficient may be determined by reflectivity.
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures