H.D. Dulman, R.H. Pantell, et al.
Physical Review B
The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
P. Alnot, D.J. Auerbach, et al.
Surface Science
A. Krol, C.J. Sher, et al.
Surface Science