R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
No abstract available.
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
J. Tersoff
Applied Surface Science