Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have measured the cluster-size distribution in thin Al-Al2O3 films near the metal-insulator transition for sheet resistances of about 1000 Ω and metal area fraction of the order of 0.5. Our results show for the first time that this distribution follows a power-law dependence and that the perimeter-to-area ratio is approximately constant for large clusters. We find good quantitative agreement between our obseryations and the predictions of percolation theory. © 1982 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R. Ghez, J.S. Lew
Journal of Crystal Growth
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
J.C. Marinace
JES