William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
The pseudo-metal oxide semiconductor field effect transistor (ψ-MOSFET)is a quick method for detailed electrical characterization of bare silicon-on-insulator wafers. A recent variant consists in using circular Hg probes. A simple analytical model for the geometrical factor, which is of primary importance of circular ψ-MOSFET applications, is presented and validated by 3-D numerical simulations. Measurements on a SIMOX wafer in both accumulation and inversion are used to test the model.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME