PaperEtch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systemsG.M. Wallraff, Carl E. Larson, et al.J. Photopolym. Sci. Tech.
PaperHyperbranched polyesters as nanoporosity templating agents for organosilicatesCattien Nguyen, C.J. Hawker, et al.Macromolecules
PaperPolymer chain organization and orientation in ultrathin films: A spectroscopic investigationM.M. Despotopoulou, R.D. Miller, et al.Journal of Polymer Science, Part B: Polymer Physics