Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The effect of film thickness on the organization kinetics of ultrathin (50-1000 Å thick) spin-cast polymer films was studied using poly(di-n-hexylsilane) and UV absorption spectroscopy. We found an extensive reduction in the crystallinity as well as a reduction in the rate of crystallization for film thicknesses below 500 Å resulting from the constrained geometry. Modeling using polymer crystallization theories elucidated the surface-induced phenomena. We found that the dimensionality of the growth depended both on the film thickness and on the crystallization temperature. At low crystallization temperatures (below 0°C) and for films thicker than 220 Å, the nucleation is bulk and the growth is three-dimensional. However, at higher crystallization temperatures (above 3°C) and for low film thickness (below 150 Å), the growth is one-dimensional and heterogeneous nucleation becomes important. For 500 Å thick films, the transition between the two nucleation regimes occurs abruptly around 3°C.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001