Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This note shows how a standard result about linear inequality systems can be used to give a simple proof of the fact that the range of a nonatomic vector measure is convex, a result that is due to Liapounoff. © 1994.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.