Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
The adsorption of O2 on Ni(110) at 500 K has been studied using He diffraction. As the coverage is increased, low-coverage (3 × 1), (2 × 1), and high-coverage (3 × 1) phases are successively formed. An analysis of the diffraction intensities for the (2 × 1) and high-coverage (3 × 1) phases and a comparison with calculated electron-density contours shows that the Ni atoms are aligned in rows parallel to the [001] direction, and that the oxygen atoms are adsorbed at long bridge sites on the surface at a normal distance of ~ 0.3 Å above the Ni atoms. © 1984.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
Sung Ho Kim, Oun-Ho Park, et al.
Small
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007