A 3D-IC technology with integrated microchannel cooling

A 3D-IC technology with integrated microchannel cooling is demonstrated in this paper. Fluidic interconnect network fabrication proceeds at the wafer-level, is compatible with CMOS processing and flip-chip assembly and requires four lithography steps. Measurements for single chips prior to 3D stacking reveal that each die in a two chip 3D stack may potentially exhibit a junction-to-ambient thermal resistance of 0.24°C/W. The demonstrated silicon die contain a through-silicon copper via density of 2500/cm2 integrated within the microchannel heat sink. ©2008 IEEE.