Nelson Felix

Publications

• Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

  • • Anuja De Silva
    • Indira Seshadri
    • et al.
  • 2017
  • J. Micro/Nanolithogr. MEMS MOEMS

• Overlay statistics for multiple exposure patterning

  • • Allen H. Gabor
    • Nelson M. Felix
  • 2017
  • SPIE Advanced Lithography 2017

• Reaching for the true overlay in advanced nodes

  • • Chiew-Seng Koay
    • Bassem Hamieh
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• DSA patterning options for logics and memory applications

  • • Chi Chun Liu
    • Elliott Franke
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Development of TiO₂ containing hardmasks through PEALD deposition

  • • Anuja De Silva
    • Indira Seshadri
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

  • • Cheng Chi
    • Chi Chun Liu
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Unexpected impact of RIE gases on lithographic films

  • • Martin Glodde
    • Robert L. Bruce
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Driving down defect density in composite EUV patterning film stacks

  • • Luciana Meli
    • Karen Petrillo
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Fundamentals of EUV resist-inorganic hardmask interactions

  • • Dario Goldfarb
    • Martin Glodde
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017

• Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer

  • • Indira Seshadri
    • Anuja De Silva
    • et al.
  • 2017
  • SPIE Advanced Lithography 2017