Incorporating process variation contours in design rule calculation and SRAM design optimization
- Dongbing Shao
- Jing Sha
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paper
Publications
7 results at SPIE Advanced Lithography 2019
EUV mask challenges and requirements for ultimate single exposure interconnects
- Chris Progler
- Michael Green
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paperFundamentals of resist stochastics effect for single-expose EUV patterning
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paperThe defect mitigation on EUV stack by track based technology
- Naoki Shibata
- Lior Huli
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paperInvestigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paperEngineering neural networks for improved defect detection and classification
- Dhruv V. Patel
- Ravi Bonam
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paperAnalog memory-based techniques for accelerating the training of fully-connected deep neural networks
- Sidney Tsai
- Stefano Ambrogio
- et al.
- 2019
- SPIE Advanced Lithography 2019
Conference paper