Publications

9 results at SPIE Advanced Lithography 2021

Effect of high NA "half-field" printing on overlay error
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Process trace analytics for process development
- - Robert J. Baseman
  - Fateh A. Tipu
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Contact local CD uniformity optimization through etch shrink
- - Eric Miller
  - Junling Sun
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Effect of surface temperature on GeSbTe damage formation during plasma processing
- - L. Buzi
  - J. M. Papalia
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Speeding up OPC by leveraging existing designs with machine learning
- - Cheng Chi
  - Julian Dolby
  - et al.
- 2021
- SPIE Advanced Lithography 2021
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
In-line Raman spectroscopy for stacked nanosheet device manufacturing
- - Daniel Schmidt
  - C. Durfee
  - et al.
- 2021
- SPIE Advanced Lithography 2021
OCD enhanced: Implementation and validation of spectral interferometry for nanosheet inner spacer indentation
- - Daniel Schmidt
  - C. Durfee
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Nanosheet Metrology Opportunities for Technology Readiness
- - Mary Breton
  - Daniel Schmidt
  - et al.
- 2021
- SPIE Advanced Lithography 2021