Publications

2 results at SPIE Photomask Technology + EUV Lithography 2017

Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- - Koichi Hontake
  - Lior Huli
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Development of amorphous silicon based EUV hardmasks through physical vapor deposition
- - Anuja De Silva
  - Yann Mignot
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017