CHARACTERIZATION OF IC DEVICES FABRICATED IN LOW TEMPERATURE (550 degree C) EPITAXY BY UHV/CVD TECHNIQUE.T.N. NguyenD.L. Harameet al.1985IEDM 1985Conference paper
0. 5- mu M-CHANNEL CMOS TECHNOLOGY OPTIMIZED FOR LIQUID-NITROGEN-TEMPERATURE OPERATION.J.Y.-C. SunY. Tauret al.1985IEDM 1985Conference paper
GaAlAs/GaAs HETEROSTRUCTURE BIPOLAR TRANSISTORS: EXPERIMENT AND THEORY.S. Tiwari1985IEDM 1985Conference paper
SELF-ALIGNED PROCESSES FOR THE GaAs GATE FET.H. BaratteD.C. La Tulipeet al.1985IEDM 1985Conference paper
ON THE IMPURITY PROFILES OF DOWN SCALED BIPOLAR TRANSISTORS.D.D. TangG.P. Liet al.1985IEDM 1985Conference paper
SELF-CONSISTENT CALCULATION OF ELECTRON STATES IN NARROW CHANNELS.S.E. LauxAlan C. Warren1985IEDM 1985Conference paper
RELIABILITY ANALYSIS OF SELF-ALIGNED BIPOLAR TRANSISTOR UNDER FORWARD ACTIVE CURRENT STRESS.T.C. ChenC. Kayaet al.1985IEDM 1985Conference paper