Polysilanes: photochemistry and deep UV lithographyR.D. MillerG.M. Wallraffet al.1988SPE Regional Technical Conference 1988
Novel photoresist design based on electrophilic aromatic substitutionB. ReckR.D. Allenet al.1988SPE Regional Technical Conference 1988
Epoxy resins for deep UV lithographyK.J. StewartM. Hatzakiset al.1988SPE Regional Technical Conference 1988