Publications

10 results at SPIE Advances in Resist Technology and Processing 1999

Approaches to etch resistant 193-nm photoresists: Performance and prospects
- - R.D. Allen
  - Juliann Opitz
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- - Thomas I. Wallow
  - P.J. Brock
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Experimental method for quantifying acid diffusion in chemically amplified resists
- - G.M. Wallraff
  - W.D. Hinsberg
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Chemically amplified resists: Past, present, and future
- - Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
NMR analysis of chemically amplified resist films
- - Hiroshi Ito
  - M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Molecular weight tailoring in methacrylate 193 nm photoresists
- - Thomas I. Wallow
  - P.J. Brock
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- - Zhijian G. Lu
  - Yuping Cui
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- - M.I. Sanchez
  - W.D. Hinsberg
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer platform dependent characteristics of 193 nm photoresists
- - Juliann Opitz
  - R.D. Allen
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
High resolution 248 nm bilayer resist
- - Q. Lin
  - K.E. Petrillo
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999