Publications

9 results at Microlithography 1992

Reduction of linewidth variation over reflective topography
- - Steve S. Miura
  - Christopher F. Lyons
  - et al.
- 1992
- Microlithography 1992
Application of atomic-force microscopy to phase-shift masks
- - A.P. Ghosh
  - D.B. Dove
  - et al.
- 1992
- Microlithography 1992
Acid generation and acid diffusion in photoresist films
- - D.R. McKean
  - R.D. Allen
  - et al.
- 1992
- Microlithography 1992
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- - W.D. Hinsberg
  - Scott A. MacDonald
  - et al.
- 1992
- Microlithography 1992
Direct phase measurements in phase-shift masks
- - A.P. Ghosh
  - D.B. Dove
- 1992
- Microlithography 1992
Critical alignments in plane mirror interferometry
- - N. Bobroff
- 1992
- Microlithography 1992
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- - R.D. Allen
  - Willard E. Conley
  - et al.
- 1992
- Microlithography 1992
Effects of polymer end groups on chemical amplification
- - Hiroshi Ito
  - William P. England
  - et al.
- 1992
- Microlithography 1992
Overlay measurements using the scanning electron microscope: accuracy and precision
- - Michael G. Rosenfield
- 1992
- Microlithography 1992