Publications

3 results at SPIE Advanced Lithography 2000

Zernike coefficients: Are they really enough?
- - C. Progler
  - Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Characterization of line width variation
- - Alfred K. Wong
  - Antoinette F. Molless
  - et al.
- 2000
- SPIE Advanced Lithography 2000
Process window metrology
- - Christopher P. Ausschnitt
  - W. Chu
  - et al.
- 2000
- SPIE Advanced Lithography 2000

Zernike coefficients: Are they really enough?