Publications

5 results at SPIE Advanced Lithography 2004

Preliminary evaluation of line edge roughness metrology based on CD-SAXS
- - Ronald L. Jones
  - Tengjiao Hu
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Deep-UV immersion interferometric lithography
- - Alex K. Raub
  - A. Frauenglass
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- - Nakgeuon Seong
  - Kafai Lai
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Fast calculation of images for high numerical aperture lithography
- - Alan E. Rosenbluth
  - Gregg Gallatin
  - et al.
- 2004
- SPIE Advanced Lithography 2004
A new approach to pattern metrology
- - Christopher P. Ausschnitt
- 2004
- SPIE Advanced Lithography 2004

Preliminary evaluation of line edge roughness metrology based on CD-SAXS