Publications

2 results at SPIE Photomask Technology 2013

Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- - Karen D. Badger
  - Michael Hibbs
  - et al.
- 2013
- SPIE Photomask Technology 2013
Two-dimensional mask effects at the 14 nm logic node
- - A.E. Zweber
  - A.E. McGuire
  - et al.
- 2013
- SPIE Photomask Technology 2013