Publications

3 results at SPIE Advanced Lithography 2005

The problem of optimal placement of Sub-Resolution Assist Features (SRAF)
- - Maharaj Mukherjee
  - Scott Mansfield
  - et al.
- 2005
- SPIE Advanced Lithography 2005
Resist blur and line edge roughness
- - Gregg M. Gallatin
- 2005
- SPIE Advanced Lithography 2005
First microprocessors with immersion lithography
- - D. Gil
  - T. Bailey
  - et al.
- 2005
- SPIE Advanced Lithography 2005

The problem of optimal placement of Sub-Resolution Assist Features (SRAF)