Oxygen interaction with defects at the Si/SiO2 interface
- J.H. Stathis
- S. Rigo
- et al.
- 1991
- Solid State Communications
Paper
Publications
14468 results for Physical Sciences
Full-Wafer Technology—a New Approach To Large-Scale Laser Fabrication and Integration
- Peter Vettiger
- Gian-Luca Bona
- et al.
- 1991
- IEEE JQE
PaperIncommensurate epitaxial growth of Cu on Pd{111}
- H. Li
- D. Tian
- et al.
- 1991
- Solid State Communications
PaperThe electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations
- U. Behringer
- W. Haug
- et al.
- 1991
- Microelectronic Engineering
PaperThe characterization of polymer interfaces
- T.P. Russell
- 1991
- Annual Review of Materials Science
PaperLight scattering properties of x-ray lithography mask substrates
- J.R. Maldonado
- Y. Vladimirsky
- et al.
- 1991
- Microelectronic Engineering
PaperSiGe alloys: growth, properties and applications
- Maurizio Arienzo
- Subramanian S. Iyer
- et al.
- 1991
- Applied Surface Science
PaperThermal stress-induced and electromigration-induced void-open failures in Al and Al-Cu fine lines
- T. Kwok
- K.K. Chan
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperGaAs opto-electronic integrated circuits for high speed optical communications
- D.L. Rogers
- 1991
- Microelectronic Engineering
PaperThe effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- John B.O. Caughman
- William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper