Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper
Publications
9296 results for Computer Science
Fully scaled 0.5 micron CMOS technology using variable shaped electron beam lithography
- Philip Coane
- Paul Rudeck
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperAdapting an english morphological analyzer for French
- Roy J. Byrd
- Evelyne Tzoukcrmann
- 1988
- ACL 1988
Conference paperInteraction of ultraviolet laser radiation with corneal tissue
- R. Srinivasan
- 1989
- Proceedings of SPIE 1989
Conference paperCompact blue and green lasers based on nonlinear optical processes
- W. Lenth
- J.-C. Baumert
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper2-Cyclooctylamino-5-nitropyridine, a new nonlinear optical crystal with orthorhombic symmetry
- P. Günter
- Ch. Bosshard
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperGarbarge collection for Prolog based on WAM
- Karen Appleby
- Mats Carllson
- et al.
- 1988
- CACM
PaperInteractive program improvement via EAVE: An expert adviser for vectorization
- Pradip Rose
- 1988
- ICS 1988
Conference paperHierarchical channel router
- Michael Burstein
- Richard Pelavin
- 1988
- DAC 1988
Conference paperThe application of program verification techniques to hardware verification
- John A. Darringer
- 1988
- DAC 1988
Conference paper