Sensitive electron beam resist systems based on acid-catalyzed deprotection
- Hiroshi Ito
- Lester A. Pederson
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper
Publications
9277 results for Computer Science
Silicon oxidation during bilayer resist etching
- Mark A. Hartney
- Justin N. Chiang
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperLaser photothermal effects for measurements and materials processing
- Andrew C. Tam
- 1989
- SPIE OE/LASE 1989
Conference paperThe role of unsteady adiabatic expansion in laser sputtering
- Roger Kelly
- 1989
- Proceedings of SPIE 1989
Conference paperSecond-harmonic diffraction from periodically modulated molecular monolayers
- T.F. Heinz
- T. Suzuki
- 1989
- Proceedings of SPIE 1989
Conference paperA suprathreshold ferry-porter law: Implications for the measurement of display flicker
- Bernice E. Rogowitz
- 1989
- Proceedings of SPIE 1989
Conference paperAblation of polymers and tissue by ultraviolet lasers
- R. Srinivasan
- 1989
- Proceedings of SPIE 1989
Conference paperMetrology with an atomic force microscope
- P.C.D. Hobbs
- H.K. Wickramasinghe
- 1989
- Proceedings of SPIE 1989
Conference paperPractical characterization of 0.5 μm optical lithography
- Donis G. Flagello
- Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989
Conference paperAqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors
- Hiroshi Ito
- 1989
- Proceedings of SPIE 1989
Conference paper