An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
Paper
Publications
14467 results for Physical Sciences
Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
PaperEffect of CO on the Low Temperature Diffusion of Cr and Si Through Thin Gold Films
- Chin-An Chang
- 2019
- JES
PaperSilicon Oxidation Studies: Some Aspects of the Initial Oxidation Regime
- E.A. Irene
- 2019
- JES
PaperControl of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density
- R.S. Horwath
- 2019
- JES
PaperII. Oxidation of Al Films
- Jean Grimblot
- Jerome M. Eldridge
- 2019
- JES
PaperInteractions Between Cr and Pt Films: New Cr-Pt Phases
- J.E.E. Baglin
- F.M. d'Heurle
- et al.
- 2019
- JES
PaperDry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
PaperThe Controlled Etching of Silicon in Catalyzed Ethylenediamine-Pyrocatechol-Water Solutions
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
PaperDeveloper Temperature Effects on E-Beam and Optically Exposed Positive Photoresist
- J.M. Shaw
- M. Hatzakis
- 2019
- JES
Paper