Aqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Publications
9077 results for Computer Science
Gel resist processing for submicron CMOS and bipolar circuits
- K.E. Petrillo
- M. Smyth
- et al.
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Bench evaluation of lithographic lenses from measurements of the point spread function
- Norman Bobroff
- Petra Fadi
- et al.
- 1989
- Proceedings of SPIE 1989
Soft vacuum pulsed electron beam processing of teflon and teflon-like films
- J. Krishnaswamy
- G.J. Collins
- et al.
- 1989
- Proceedings of SPIE 1989
Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing
- Eberhard Spiller
- 1989
- Proceedings of SPIE 1989
A double crystal multilayer x-ray monochromator
- L. Golub
- A. Quillen
- et al.
- 1989
- Proceedings of SPIE 1989
Filters for soft x-ray solar telescopes
- Eberhard Spiller
- Kurt Grebe
- et al.
- 1989
- Proceedings of SPIE 1989
Modeling of optical alignment images for semiconductor structures
- Chi-Min Yuan
- Jerry Shaw
- et al.
- 1989
- Proceedings of SPIE 1989
Imaging of liquid crystals using a tunneling microscope
- J.S. Foster
- J.E. Frommer
- et al.
- 1989
- Proceedings of SPIE 1989