Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Publications
101 results at Proceedings of SPIE - The International Society for Optical Engineering
Circular dielectric gratings acting as resonators for solid state polymer lasers
- C. Bauer
- H. Giessen
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Layout and language: An efficient algorithm for detecting text blocks based on spatial and linguistic evidence
- Matthew Hurst
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Color halftone descreening based on color sigma filters
- Chunghui Kuo
- A. Ravishankar Rao
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
CAMEL: Concept Annotated iMagE Libraries
- Apostol (Paul) Natsev
- Atul Chadha
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
An algorithm for efficient segmentation and selection of representative frames in video sequences
- Konstantin Y. Kupeev
- Zohar Sivan
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
100 nm gate lithography for double gate transistors
- Azalia Krasnoperova
- Ying Zhang
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Asymmetric biasing for subgrid pattern adjustment
- Alfred K. Wong
- Lars W. Liebmann
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Advanced lithography kits: Serifs and hammerhead
- Hang-Yip Liu
- Steffen Schulze
- et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering