Effects of polymer end groups on chemical amplification
- Hiroshi Ito
- William P. England
- et al.
- 1992
- Microlithography 1992
Conference paper
Publications
9296 results for Computer Science
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Conference paperHigh-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Conference paperApplication of atomic-force microscopy to phase-shift masks
- A.P. Ghosh
- D.B. Dove
- et al.
- 1992
- Microlithography 1992
Conference paperOverlay measurements using the scanning electron microscope: accuracy and precision
- Michael G. Rosenfield
- 1992
- Microlithography 1992
Conference paperDirect phase measurements in phase-shift masks
- A.P. Ghosh
- D.B. Dove
- 1992
- Microlithography 1992
Conference paperParallel complexity of computing a maximal set of disjoint paths
- Alok Aggarwal
- 1992
- Information Processing Letters
PaperAn abstract theory for the domain reduction method
- C.C. Douglas
- J. Mandel
- 1992
- Computing
PaperUsing the refinement equation for the construction of pre-wavelets V: Extensibility of trigonometric polynomials
- R.-Q. Jia
- C.A. Micchelli
- 1992
- Computing
PaperA queueing network with a single cyclically roving server
- Moshe Sidi
- Hanoch Levy
- et al.
- 1992
- Queueing Systems
Paper