Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- Chris Bencher
- Jeffrey Smith
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
3611 results for Mathematical Sciences
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperBound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperSystematic studies on reactive ion etch-induced deformations of organic underlayers
- Martin Glodde
- Sebastian Engelmann
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperExtending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperRevisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperFundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperQuantitative analysis of parallelism and data movement properties across the Berkeley computational motifs
- Victoria Caparrós Cabezas
- Phillip Stanley-Marbell
- 2011
- CF 2011
Conference paper