EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
3611 results for Mathematical Sciences
Architecture and mechanisms of Hadoop distributed file system
- Wen-Qiang Xu
- Long-Bin Lai
- et al.
- 2011
- Dongbei Daxue Xuebao/Journal of Northeastern University
PaperA trace-based Java JIT compiler retrofitted from a method-based compiler
- Hiroshi Inoue
- Hiroshige Hayashizaki
- et al.
- 2011
- CGO 2011
Conference paperAdaptive identification in torii in the king lattice
- Yael Ben-Haim
- Antoine Lobstein
- et al.
- 2011
- Electronic Journal of Combinatorics
PaperReconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperOverlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Conference paperPerformance of tri-layer process required for 22nm and beyond
- Yayi Wei
- Martin Glodde
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperRevisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperExtending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperCritical challenges for "non-critical" layers
- J.M. Gomez
- I.Y. Popova
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper