The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Publications
14361 results for Physical Sciences
On the Nature of CVD Si-Rich SiO2 and Si3N4 Films
- E.A. Irene
- N.J. Chou
- et al.
- 2019
- JES
Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
All Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related Polymers
- H. Hiraoka
- 2019
- JES
On the Role of Buffers and Anions in NiFe Electrodeposition
- Jean Horkans
- 2019
- JES
Investigation of Laser-Enhanced Electroplating Mechanisms
- J. Cl. Puippe
- R.E. Acosta
- et al.
- 2019
- JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
Effects of Several Parameters on the Corrosion Rates of Al Conductors in Integrated Circuits
- Israel Lerner
- Jerome M. Eldridge
- 2019
- JES
Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
- Lester A. Pederson
- 2019
- JES