Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- Gregory McIntyre
- Daniel Corliss
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
3602 results for Mathematical Sciences
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperArchitecture and mechanisms of Hadoop distributed file system
- Wen-Qiang Xu
- Long-Bin Lai
- et al.
- 2011
- Dongbei Daxue Xuebao/Journal of Northeastern University
PaperA trace-based Java JIT compiler retrofitted from a method-based compiler
- Hiroshi Inoue
- Hiroshige Hayashizaki
- et al.
- 2011
- CGO 2011
Conference paperAdaptive identification in torii in the king lattice
- Yael Ben-Haim
- Antoine Lobstein
- et al.
- 2011
- Electronic Journal of Combinatorics
PaperOverlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Conference paperReconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperSelf-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- Chris Bencher
- Jeffrey Smith
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperCritical challenges for "non-critical" layers
- J.M. Gomez
- I.Y. Popova
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperVisualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper