Comparison of scalar and vector diffraction modelling for deep-UV lithography
- Bruce W. Smith
- Donis G. Flagello
- et al.
- 1993
- Microlithography 1993
Publications
9081 results for Computer Science
TAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
Vector diffraction analysis of phase-mask imaging in photoresist films
- Donis G. Flagello
- Alan E. Rosenbluth
- 1993
- Microlithography 1993
170 nm gates fabricated by phase-shift mask and top anti-reflector process
- T.A. Brunner
- P.N. Sanda
- et al.
- 1993
- Microlithography 1993
Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- T.A. Brunner
- 1993
- Microlithography 1993
Process optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
A tetrahedral interpolation technique for color space conversion
- James M. Kasson
- Wil Plouffe
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Developments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
On the complexity of queries in the logical data model
- Gabriel M. Kuper
- Moshe Y. Vardi
- 1993
- Theoretical Computer Science