Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Publications
3593 results for Mathematical Sciences
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Architecture and mechanisms of Hadoop distributed file system
- Wen-Qiang Xu
- Long-Bin Lai
- et al.
- 2011
- Dongbei Daxue Xuebao/Journal of Northeastern University
A trace-based Java JIT compiler retrofitted from a method-based compiler
- Hiroshi Inoue
- Hiroshige Hayashizaki
- et al.
- 2011
- CGO 2011
Adaptive identification in torii in the king lattice
- Yael Ben-Haim
- Antoine Lobstein
- et al.
- 2011
- Electronic Journal of Combinatorics
Reconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011
Critical challenges for "non-critical" layers
- J.M. Gomez
- I.Y. Popova
- et al.
- 2011
- SPIE Advanced Lithography 2011